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IAS / SCHOOL OF ENGINEERING JOINT LECTURE
Surface Modifications of Micro and Millimeter Size Particles with Plasma Enhanced Chemical Vapor Deposition
Prof Philipp Rudolf von Rohr, Professor for Process Engineering, ETH Zurich
Date : 16 Apr 2015 (Thursday)
Time : 2:30 - 3:30 pm
Venue : Mr and Mrs Lee Siu Lun Lecture Theater (LT-K), HKUST
Video & Photos Details

Prof Philipp Rudolf von Rohr from ETH Zurich demonstrates the huge potential of Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Enhanced Surface Modification (PESM) in two reactor types, and presents the different processes and some specific chemical, biological and physical results of them.

The lecture is free and open to all. Seating is on a first-come, first-served basis.

HKUST Jockey Club Institute for Advanced Study
Enquiries: ias@ust.hk / 2358 5912
http://ias.ust.hk

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